In this paper I review research and development in the area of low temperature polysilicon (p-Si) formation for application in advanced display systems. A brief introduction to the scope of these efforts and the market for this technology is given, followed by a presentation of the methods that are being developed to meet these objectives. The technical merits and demerits of various approaches for low-temperature p-Si formation are reviewed on the basis of current studies, and an attempt is made to extrapolate trends and suggest solutions for the technical difficulties that currently plague the development of a manufacturing-compatible process.
本稿では，新規ディスプレイとして商品化が始まった低温ポリシリコンTFT技術の現状について概説する。
特にポリシリコン膜の形成技術について論文発表された種々の技法について整理，紹介し，その技術的課題及び解決へのアプローチについて解説する。
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